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bn:03445008n
Noun Concept
Categories: Thin film deposition, Chemical processes, Chemical vapor deposition, Coatings, All articles containing potentially dated statements
EN
chemical vapor deposition  Microwave Plasma-assisted CVD  APCVD  Atmospheric Pressure CVD  Atomic Layer CVD
EN
Chemical vapor deposition is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. Wikipedia
Definitions
Relations
Sources
EN
Chemical vapor deposition is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. Wikipedia
A chemical process used in the semiconductor industry to produce thin films Wikipedia Disambiguation
Process used to make thin films for semiconductors or surface coating Wikidata
IS A
thin-film deposition
Wikipedia
EN
chemical vapor deposition
Wikidata
EN
Chemical vapor deposition
Wikipedia Redirections
EN
APCVD, Atmospheric Pressure CVD, Atomic Layer CVD, Chemical deposition, Chemical Vapor Deposition, chemical vapor deposition of diamond, chemical vapor disposition, chemical vapour deposition, Chemical vapour deposition of diamond, Low pressure chemical vapor deposition, Low Pressure CVD, Low Temperature Oxide, LPCVD, Metal-Organic CVD, Microwave plasma-assisted CVD, Microwave Plasma-assisted CVD, MPCVD, PEVCD, Rapid Thermal CVD, Remote Plasma Enhanced CVD, RPECVD, RTCVD, spray pyrolysis, UHV/CVD, UHV CVD, UHVCVD, Ultra-High Vacuum CVD, vapour deposition
Wikidata Alias
EN
chemical vapour deposition, CVD

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