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bn:03875670n
Noun Concept
Categories: 1995 introductions, International Technology Roadmap for Semiconductors lithography nodes, Nanotechnology stubs
EN
350 nm lithography process  350 nm process  0.35-micrometre  0.35-micron  0.35 μm
EN
The 350 nanometer process is a level of semiconductor process technology that was reached in the 1995–1996 timeframe by leading semiconductor companies like Intel and IBM. Wikipedia
Definitions
Relations
Sources
EN
The 350 nanometer process is a level of semiconductor process technology that was reached in the 1995–1996 timeframe by leading semiconductor companies like Intel and IBM. Wikipedia
Semiconductor manufacturing processes with a 350 nm MOSFET technology node Wikidata
IS A
photolithography
FOLLOWED BY
250 nm lithography process
FOLLOWS
600 nm lithography process
STATED IN
International Technology Roadmap for Semiconductors
Wikipedia
EN
350 nm process
Wikidata
EN
350 nm lithography process
Wikipedia Redirections
EN
350 nanometer, 350 nanometre, 350 nm, 350nm
Wikidata Alias
EN
0.35-micrometre, 0.35-micron, 0.35 μm, 0.35μm, 350 nanometre process, 350 nm, 350nm

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